one target DC magnetron sputtering coating machine

Single target DC magnetron sputtering coating CY-MSP300S-DC
a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. The magnetron target head can be selected from 1 inch 2 inches 3 inches. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 1500W high power DC power supply, which can be used for high energy metal sputter coating. Other specifications of DC or RF power supply can be selected to achieve coating operation of various materials.
The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas path of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Application:
This device can be used for preparing single-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the single target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Technical parameters:
Sample stage:Size:φ185mm;Temperature control accuracy±1℃;Max Heating temperature:500℃;Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head:2" 1 (1",2",3", 4"optional); Water chiller:Circulating water chiller with flow rate of 10L/min
Sputtering power configuration:DC power supply 1;Max output power 1500W
Vacuum chamber: material:stainless steel;size:φ300mm 300mm;Watch window:φ100mm;ChamberOpening mode:Top cover open
Mass flowmeter:2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)
Vacuum system Model:CY-GZK103-A
Pumping interface:KF40; Exhaust interface:KF16;Power supply:AC;220V 50/60Hz
Molecular pump:CY-600;Backing pump:rotary vane pump
Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa

Other parameters
Supply voltage:AC220V,50Hz
Overall size:600mm 650mm 1280mm
Total power:3KW Total Weight:300kg