single-target RF magnetron sputtering vacuum PVD coater

Single-target RF magnetron sputtering coater CY-MSP300S-RF
a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch 2 inches and 3 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 300W RF power supply, which can be used for sputtering of non-metal film and optical film. According to the experimental requirements, other specifications of DC or RF power supply can be selected to realize the coating operation of various materials.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Application:
The device can be used to prepare single-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the single-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for research on solid electrolyte and OLED in the laboratory.

Technical parameters:
Sample stage: Size φ185mm;Temperature control accuracy:±1℃; MaxHeating temperature:500℃;Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head:2" 1 (1",2",3"optional);Circulating water chiller with flow rate of 10L/min
Vacuum chamber:Stainless steel,φ300mm 300mm；Watch window φ100mm;Opening mode:top cover removable
Mass flow meter:2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)
Vacuum system
Model:CY-GZK103-A; Molecular pump:CY-600;Backing pump:rotary vane pump
Pumping interface KF40 Exhaust interface KF16;Power supply:AC;220V 50/60Hz
Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa
Pumping rate Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration:RF power supply 1 Max output power 300W
Overall size:600mm 650mm 1280mm; Total power:2KW; Total Weight:300kg; Supply voltage:AC220V,50Hz