Small desktop single-target DC magnetron sputtering coater
Descripción de
Small desktop single-target DC magnetron sputtering coater
:
Small desktop single-target DC magnetron sputtering coater CY-MSP180G-DG
a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 150W DC power supply, which can be used for metal sputter coating. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Application:
The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Technical parameters:
Sample stage:Sizeφ138mm Max Heating temperature 500℃,Temperature control accuracy±1℃,Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head:2" 1 (1",2" optional):Circulating water chiller with flow rate of 10L/min
Sputter power configuration:DC power supply x1 Max output power:150W
Vacuum chamber:High purity quartz size φ180mm 215mm; Watch window:Omnidirectional transparent;Opening mode:Top cover removable
Vacuum system
Model:CY-GZK103-A Pumping interface KF40
Molecular pump CY-600 Exhaust interface KF16
Backing pump rotary vane pump Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa Power supply AC;220V 50/60Hz
Pumping rate Molecular pump: 600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Other parameters
Supply voltage:AC220V,50Hz Overall size:500mm 350mm 400mm;Total power:1.7KW (Vacuum pump1.5KW+machine0.2KW);Total Weight:About 30kg
a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 150W DC power supply, which can be used for metal sputter coating. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Application:
The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Technical parameters:
Sample stage:Sizeφ138mm Max Heating temperature 500℃,Temperature control accuracy±1℃,Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head:2" 1 (1",2" optional):Circulating water chiller with flow rate of 10L/min
Sputter power configuration:DC power supply x1 Max output power:150W
Vacuum chamber:High purity quartz size φ180mm 215mm; Watch window:Omnidirectional transparent;Opening mode:Top cover removable
Vacuum system
Model:CY-GZK103-A Pumping interface KF40
Molecular pump CY-600 Exhaust interface KF16
Backing pump rotary vane pump Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa Power supply AC;220V 50/60Hz
Pumping rate Molecular pump: 600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Other parameters
Supply voltage:AC220V,50Hz Overall size:500mm 350mm 400mm;Total power:1.7KW (Vacuum pump1.5KW+machine0.2KW);Total Weight:About 30kg
DC sputtering coater
magnetron sputtering
magnetron sputtering coater
sputtering coater
vacuum PVD coater
ID producto: 10654650
| Referencia: vacuum PVD coater
| Vendido por:
Zhengzhou CY Scientific Instrument Co.,
Fecha de alta del producto 30/06/2020
-
Modificado por el vendedor 30/06/2020
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Small desktop single-target DC magnetron sputtering coater
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