two-target RF magnetron sputtering PVD coating equipment

Dual-target RF magnetron sputtering coater CY-MSP300S-2RF
a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with two 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Application:
The device can be used for preparing single or multi-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coating machine is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing a material film in a laboratory.

Technical parameters:
Sample stage:Sizeφ185mm;Temperature control accuracy:±1℃;Max Heating temperature:500℃;Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head:2" 2 (1",2" optional) ;Water chiller:Circulating water chiller with flow rate of 10L/min
Sputtering power configuration:RF power supply 2 Max output power RF 300 W;
Vacuum chamber: material:Stainless steel; size:φ300mm 300mm;Watch window:φ100mm;Opening mode:Top cover open
Mass flowmeter:2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs)
Vacuum system
Model:CY-GZK103-A:Pumping interface:KF40 ;Exhaust interface:KF16;Power supply:AC;220V 50/60Hz
Molecular pump:CY-600;Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Pumping rate:Molecular pump: 600L/S ;rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Other parameters
Supply voltage:AC220V,50Hz;Overall size:600mm 650mm 1280mm;Total power :2.5KW;Total Weight:About 300kg